ENPI photoresist

The ENPI series consists of alkaline-developable negative photoresists specially engineered for lift-off processes. Its signature inverted trapezoid profile is critical to achieving high-precision lift-off of metal circuits.The ENPI series is mainly divided into the 200 series and 300 series, tailored to meet the application requirements of LED, RDL, PMOLED and AMOLED respectively.

产品详情

Ⅰ、ENPI 200 series

Resist Film Thickness:2~6um

ENPI 300 series                        

Resist Film Thickness:1~20um

Property:

1. High thermal resistance;

2. High resolution;                                                                                                                                                            

3. Wide angle margin of pattern.


Ⅱ、Application Fields:

1. LED Chip Manufacturing:

Used for the fabrication of metal electrodes on LED chips to improve light extraction efficiency.


2. Display Panel (OLED):

Applied for the patterning of pixel pillars/ribs and metal electrodes in PMOLED and AMOLED devices.


3. Advanced IC Packaging:

Widely used in 2.5D/3D packaging processes, including gold bumping, copper pillar fabrication, and RDL (redistribution layer) patterning.


4. MEMS Manufacturing:

Adopted for high-precision patterning of microsensors and microactuators in MEMS fabrication.


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