PSS photoresist

PSS photoresist is a dedicated lithographic material and a critical raw material for fabricating PSS wafers. It serves as the core etching mask throughout the standardized mass production process of PSS. The process flow is as follows: First, the photoresist is uniformly coated on flat sapphire substrates. Next, exposure and development are performed via lithography equipment to accurately transfer periodic patterns (such as cones, cylinders, gratings, etc.) from the photomask onto the resist fi

产品详情

Ⅰ、EPI 612 series

Resist Film Thickness:1.5~4.5um

Property:

1. High resolution;

2. Excellent etching resistance;

3. High thermal resistance;

4. Wide process margin.


Ⅱ、Application Fields:

1. LED Lighting:

Applicable to traditional blue and green LEDs, high-brightness lighting, deep-ultraviolet LEDs and other lighting scenarios. As a core technology for sapphire substrate patterning, PSS technology can effectively improve the light extraction efficiency and service life of LED devices.


2. Display Applications:

Widely adopted in Mini/Micro LED, backlight display, and RGB direct display fields. With the accelerated industrialization of Mini/Micro LED, the market demand for high-performance PSS photoresist continues to grow steadily.


3. Automotive Electronics:

Applied to automotive lighting and vehicle display scenarios. Market demand keeps expanding alongside the rapid penetration of new energy vehicles and in-vehicle display technologies.


4. Gallium Nitride (GaN) Power Devices:

PSS technology can be applied to substrate patterning for next-generation high-efficiency GaN power devices, opening up new growth opportunities in the power semiconductor industry.



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